What is Hafnium Disilicide HFSi2?
Hafnium Silicide (or hafnium Disilicide) has a molecularweight of 234.66. It is a gray powder.
Hafnium diilicide is a transition metal silicide and also a form of refractory intrametallic compound. Hafnium disilicide’s distinct physical and chemical properties are well-received by areas of bulk structural components of semiconductor components, bulk metallic components, and thermoelectric materials.
Hafnium disilicide nanomaterials show special electrical, optical, magnetic and thermoelectric properties, and could be used in the field of catalysis.
What is Hafnium disilicide HfSi2 employed for?
1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating
Carbon carbon reinforced with fiber (Chand C), a new high-temperature resistant type of composite that uses carbon fiber as reinforcement, and carbon as the matrix. Due to its superior high temperature strength, ablation resistance, and excellent wear and friction properties, in the 1970s, researchers in the United States carried out the research work of Chammer C composites for thermal structure, which resulted in the creation of Cmax C composites from cauterized heat-proof materials to thermal structure materials. C/C is a good choice as an element of thermal structure in gas turbine engines, spacecraft nose cone cap and wing lead edge and many other places. The components can be utilized in high-temperature environments and for oxidation.
CPAC composites can oxidize easily and will not work in an oxidation environment above 400. Chammer C composites should have proper antioxidation protection. One of the best protection measures is the creation of antioxidation coatings. The results indicated that C/C composites’ ablation resistance can be enhanced by adding refractory metal Zr. Hf. Ta. TiB2 or other refractory elements in the carbon matrix. To understand the effect of the metal Hf,Ta on ablation efficiency of Chand-C composites SiC-HfSi2-TaSi2 anti-ablation layer was by embedding method, and the ablation performance of the coating was evaluated using an oxyacetylene ablation instrument. Knot.
2. To make organic light-emitting devices
The package cover covers the light-emitting layer and the cathode of the anode. The package cover comprises a silicon carbonitride layer and an insulating layer that is formed over the silicon carbonitride surface. The barrier layer is composed of silicide and metal oxides chosen from at minimum one of chromium silicide tantalum disilicide, hafnium silicide, titanium disilicide, molybdenum disilicide and tungsten disilicide, and the metal oxide is chosen from aluminum oxide, magnesium oxide trioxide, titanium dioxide zirconium oxide hafnium dioxide, tantalum pentoxide. The life span of these organic light emitting devices is longer.
3. To prepare silicon-germanium-alloy-based thermoelectric components
The silicon-germanium alloy-based thermoelectric element is composed of an electrode layer, a silicon-germanium alloy thermoelectric layer, and an intermediate layer that is between the electrode layer and the silicon-germanium alloy thermoelectric layer. The barrier layer is a mixture of silicon nitride and silicide. The silicide includes at least one silicide from the following categories: molybdenum silicide; cobalt and tungsten silicides and nickel silicide, zirconium silicide, tantalum silicide; hafnium or hafniumsilicide. The silicon/germanium alloy’s interface thermal element is solidly bonded. There isn’t any crack or apparent diffusion phenomena at the interface.
4. To prepare the coating for composites made of cermet with high temperature resistance.
The composition of the composite film is made up of refractory metal, carbid and intermetallic compound. The coating’s thickness varies from 10mm to 50mm. The refractory is one or multiple of molybdenum (tantalum) zirconium (zirconium) and hafnium. The silicon carbide is made up mainly of silicon carbide but also one or two of zirconium carbide, tantalum silicide, or zirconium carbide. The intermetallic compounds are molybdenum silicides, zirconium silicides, tantalum silicides or zirconium silicide or zirconium silicide zirconium silicide or zi silicide, hafnium silicide or silicide, or hafnium silicide, or zironium carbosilicide, zirconium silicidesilicidesilicidesilicidesilicide or molybdenum alum silicide or molybdenum refractory silicide and tantalum The crystal structure for the coating is composed of amorphous nanoparticles and/or polycrystalline ones.
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Hafnium Silicide HfSi2 powder Supplier
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